Latypov, Azat M.: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations

Hohle, Christoph K., Gronheid, Roel, Chunder, Anindarupa, Latypov, Azat, Chen, Yulu, Biafore, John J., Levinson, Harry J., Bailey, Todd

Year:

2017

Language:

english

File:

PDF, 428 KB

english, 2017

2

New self-assembling systems based on bola-type pyrimidinic surfactants

Lucia Zakharova, Victor Syakaev, Mikhail Voronin, Vyacheslav Semenov, Farida Valeeva, Alsu Ibragimova, Azat Bilalov, Rashit Giniyatullin, Shamil Latypov, Vladimir Reznik, Alexander Konovalov

Journal:

Journal of Colloid and Interface Science

Year:

2010

Language:

english

File:

PDF, 834 KB

english, 2010

3

New Conservative Formulations of Full-Potential Equation in Streamline-Aligned Coordinates

Latypov, Azat M.

Journal:

Year:

1997

Language:

english

File:

PDF, 138 KB

english, 1997

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Estimation of effects of thermal fluctuations in graphoepitaxy DSA of cylinder-forming block copolymers

Hohle, Christoph K., Gronheid, Roel, Bowen, Alec, Latypov, Azat, Bailey, Todd

Year:

2017

Language:

english

File:

PDF, 429 KB

english, 2017

5

Improving the lithographic process window using directed self-assembly-aware printing assist features

Latypov, Azat, Coskun, Tamer H.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 4.36 MB

english, 2015

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - A full-chip DSA correction framework

Resnick, Douglas J., Bencher, Christopher, Wang, Wei-Long, Latypov, Azat, Zou, Yi, Coskun, Tamer

Year:

2014

Language:

english

File:

PDF, 2.08 MB

english, 2014

7

S6 permutein shows that the unusual target topology is not responsible for the absence of rigid tertiary structure in de novo protein albebetin

Ziedulla Kh. Abdullaev, Ramil F. Latypov, Azat Ya. Badretdinov, Dmitry A. Dolgikh, Alexey V. Finkelstein, Vladimir N. Uversky, Mikhail P. Kirpichnikov

Journal:

Year:

1997

Language:

english

File:

PDF, 352 KB

english, 1997

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Towards the fast DSA: improvement of computational performance of the DSA model

Resnick, Douglas J., Bencher, Christopher, Latypov, Azat

Year:

2014

Language:

english

File:

PDF, 683 KB

english, 2014

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends

Resnick, Douglas J., Bencher, Christopher, Latypov, Azat, Coskun, Tamer H., Garner, Grant, Preil, Moshe, Schmid, Gerard, Xu, Ji, Zou, Yi

Year:

2014

Language:

english

File:

PDF, 709 KB

english, 2014

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Computational simulation of block copolymer directed self-assembly in small topographical guiding templates

Yi, He, Tong, William M., Resnick, Douglas J., Latypov, Azat, Wong, H.-S. Philip

Year:

2013

Language:

english

File:

PDF, 1.39 MB

english, 2013

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Exploration of the directed self-assembly based nano-fabrication design space using computational simulations

Latypov, Azat, Tong, William M., Resnick, Douglas J., Preil, Moshe, Schmid, Gerard, Xu, Ji, Yi, He, Yoshimoto, Kenji, Zou, Yi

Year:

2013

Language:

english

File:

PDF, 1.42 MB

english, 2013

12

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Achieving mask-based imaging with optical maskless lithography

Stone, Elizabeth M., Lercel, Michael J., Hintersteiner, Jason D., Cebuhar, Wenceslao A., Albright, Ronald, Eib, Nicholas K., Latypov, Azat, Baba-Ali, Nabila, Poultney, Sherman K., Croffie, Ebo H.

Year:

2006

Language:

english

File:

PDF, 1.33 MB

english, 2006

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

Panning, Eric M., Goldberg, Kenneth A., Biafore, John J., Latypov, Azat, Chunder, Anindarupa, Brendler, Andy, Levinson, Harry J., Bailey, Todd

Year:

2017

Language:

english

File:

PDF, 729 KB

english, 2017

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Computational solution of inverse directed self-assembly problem

Latypov, Azat, Tong, William M., Resnick, Douglas J.

Year:

2013

Language:

english

File:

PDF, 584 KB

english, 2013

15

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node

Croffie, Ebo H., Eib, Nick, Callan, Neal P., Baba-Ali, Nabila, Latypov, Azat, Hintersteiner, Jason, Sandstrom, Torbjorn, Bleeker, Arno, Cummings, Kevin D., Kimmel, Kurt R., Staud, Wolfgang

Year:

2003

Language:

english

File:

PDF, 2.62 MB

english, 2003

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - EUV OPC for the 20-nm node and beyond

Clifford, Chris H., Zou, Yi, Latypov, Azat, Kritsun, Oleg, Wallow, Thomas, Levinson, Harry J., Jiang, Fan, Civay, Deniz, Standiford, Keith, Schlief, Ralph, Sun, Lei, Wood, Obert R., Raghunathan, Sudha

Year:

2012

Language:

english

File:

PDF, 3.02 MB

english, 2012

17

Structural Studies of Component of Lysoamidase Bacteriolytic Complex fromLysobactersp. XL1

Tishchenko, Svetlana, Gabdulkhakov, Azat, Melnik, Bogdan, Kudryakova, Irina, Latypov, Oleg, Vasilyeva, Natalya, Leontievsky, Alexey

Journal:

The Protein Journal

Year:

2016

Language:

english

File:

PDF, 1.07 MB

english, 2016

18

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Optical rasterization algorithms for contrast devices utilizing different physical modulation principles in optical maskless lithography

Latypov, Azat, Mackay, R. Scott, Albright, Ronald, BabaAli, Nabila, Cebuhar, Wenceslao A., Hintersteiner, Jason D., Stone, Elizabeth

Year:

2005

Language:

english

File:

PDF, 350 KB

english, 2005

19

[Society of Petroleum Engineers SPE Annual Caspian Technical Conference and Exhibition - Baku, Azerbaijan (2017-11-01)] SPE Annual Caspian Technical Conference and Exhibition - First Intelligent Multilateral TAML5 Wells on Filanovskogo Field

Golenkin, Mikhail Yurievich, Latypov, Artur Spartakovich, Shestov, Sergei Alexandrovich, Bulygin, Igor Alexandrovich, Khakmedov, Azat Meredovich

Language:

english

File:

PDF, 2.22 MB

english

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - DSA-aware assist features

Resnick, Douglas J., Bencher, Christopher, Latypov, Azat, Coskun, Tamer H.

Year:

2015

Language:

english

File:

PDF, 2.13 MB

english, 2015

21

[Society of Petroleum Engineers SPE Annual Caspian Technical Conference and Exhibition - Baku, Azerbaijan (2017-11-01)] SPE Annual Caspian Technical Conference and Exhibition - First Intelligent Multilateral TAML5 Wells on Filanovskogo Field (Russian)

Golenkin, Mikhail Yurievich, Latypov, Artur Spartakovich, Shestov, Sergei Alexandrovich, Bulygin, Igor Alexandrovich, Khakmedov, Azat Meredovich

Language:

russian

File:

PDF, 1.70 MB

russian

22

Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem

Latypov, Azat, Garner, Grant, Preil, Moshe, Schmid, Gerard, Wang, Wei-Long, Xu, Ji, Zou, Yi

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 1.35 MB

english, 2014

23

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators

Latypov, Azat, Martin, Patrick M., Naber, Robert J.

Year:

2006

Language:

english

File:

PDF, 400 KB

english, 2006

24

[Society of Petroleum Engineers Asia Pacific Oil and Gas Conference & Exhibition - Jakarta, Indonesia (2009-08-04)] Asia Pacific Oil and Gas Conference & Exhibition - Hydraulic Fracture Geometry Investigation for Successful Optimization of Fracture Modeling and Overall Development of Jurassic Formation in Western Siberia

Nikitin, Alexey, Yudin, Alexey V., Latypov, Ilyas, Haidar, Azat M., Borisov, Gleb A.

Language:

english

File:

PDF, 1.93 MB

english

25

[ACM Press the 25th edition - Pittsburgh, Pennsylvania, USA (2015.05.20-2015.05.22)] Proceedings of the 25th edition on Great Lakes Symposium on VLSI - GLSVLSI '15 - Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design

Ou, Jiaojiao, Yu, Bei, Gao, Jhih-Rong, Pan, David Z., Preil, Moshe, Latypov, Azat

Year:

2015

Language:

english

File:

PDF, 776 KB

english, 2015

26

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Systematic study of source mask optimization and verification flows

Ben, Yu, Latypov, Azat, Chua, Gek Soon, Zou, Yi, Kato, Kokoro

Year:

2012

Language:

english

File:

PDF, 241 KB

english, 2012

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